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Surface and Coatings Technology

Volumn 74-75, Issue PART 1, 1995, Pages 110-117

Infrared ellipsometric characterization of mixed phase BN layers deposited by plasma enhanced physical vapor deposition

(2) Barth, K L a Lunk, A a

a UNIVERSITY OF STUTTGART (Germany)

Author keywords

Boron nitride; FTIR ellipsometry; FTIR spectroscopy; Plasma enhanced deposition; Plasma parameter

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC RESISTANCE; ELECTRON BEAMS; ELECTRON DIFFRACTION; ELLIPSOMETRY; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMAS; VAPOR DEPOSITION; X RAY DIFFRACTION;

BORON NITRIDE; HOLLOW CATHODE ARC; INFRARED ELLIPSOMETER; NITROGEN PRESSURE; PLASMA ENHANCED DEPOSITION; PLASMA PARAMETER;

BORON COMPOUNDS;

EID: 0029373460 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/0257-8972(95)08297-2 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.