Residual stresses in nitride hard coatings prepared by magnetron sputtering and arc evaporation

Surface and Coatings Technology

Volumn 74-75, Issue PART 1, 1995, Pages 273-278

  Oettel, H ^a   Wiedemann, R ^a   Preissler S ^a  

^a TU BERGAKADEMIE FREIBERG   (Germany)

Author keywords

Annealing; Chemical composition; Lattice defects; Residual stress; Thin hard coatings

Indexed keywords

ANNEALING; ARGON; ATOMS; COMPOSITION; CRYSTAL DEFECTS; EVAPORATION; IONS; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; RESIDUAL STRESSES;

ARC EVAPORATION; COMPRESSIVE STRESS; NITRIDE HARD COATINGS; THIN HARD COATINGS;

COATINGS;

EID: 0029373369     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)08235-2     Document Type: Article

References (16)

1. TiN hard coatings deposited on high-speed steel substrates by reactive direct current magnetron sputtering
2. Nitrogen, oxygen, and argon incorporation during reactive sputter deposition of titanium nitride