Surface morphologies and electrical properties of (ba, sr)tio3 films prepared by two-step deposition of liquid source chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 34, Issue 9, 1995, Pages 5077-5082

  Kawahara, Takaaki ^a   Yamamuka, Mikio ^a   Yuuki, Akimasa ^a   Ono, Kouichi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Absorption current; BST; Capacitor; DRAM; Leakage current; Liquid source CVD; Step coverage; Two step deposition

Indexed keywords

ANNEALING; ASPECT RATIO; BARIUM TITANATE; CAPACITORS; CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; LEAKAGE CURRENTS; MORPHOLOGY; PLATINUM; RANDOM ACCESS STORAGE; SUBSTRATES; SURFACE PROPERTIES;

ABSORPTION CURRENT; BARIUM STRONTIUM TITANATE FILMS; LIQUID SOURCE CHEMICAL VAPOR DEPOSITION; STEP COVERAGE;

DIELECTRIC FILMS;

EID: 0029369259     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.34.5077     Document Type: Article

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