-
2
-
-
0026390651
-
Response of advanced bipolar process to ionizing radiation
-
E. W. Enlow, R. L. Pease, W. E. Combs, R. D. Schrimpf and R. N. Nowlin, “Response of advanced bipolar process to ionizing radiation,” IEEE Trans. Nucl. Sci., vol. 38, no. 6, pp. 1342–1352, 1991.
-
(1991)
IEEE Trans. Nucl. Sci.
, vol.38
, Issue.6
, pp. 1342-1352
-
-
Enlow, E.W.1
Pease, R.L.2
Combs, W.E.3
Schrimpf, R.D.4
Nowlin, R.N.5
-
3
-
-
84939758992
-
Trends in the total-dose response of modern bipolar transistors
-
R. N. Nowlin, E. W. Enlow, R. D. Schrimpf, and W. E. Combs, “Trends in the total-dose response of modern bipolar transistors,” IEEE Trans. Nucl. Sci., vol. 39, no. 6, pp. 2026–2035, 1992.
-
(1992)
IEEE Trans. Nucl. Sci.
, vol.39
, Issue.6
, pp. 2026-2035
-
-
Nowlin, R.N.1
Enlow, E.W.2
Schrimpf, R.D.3
Combs, W.E.4
-
4
-
-
5844399719
-
Low-temperature silicon epitaxy by ultrahigh vacuum chemical deposition
-
B. S. Meyerson, “Low-temperature silicon epitaxy by ultrahigh vacuum chemical deposition,” Appl. Phys. Lett., vol. 48, no. 12, pp. 797–799, 1986.
-
(1986)
Appl. Phys. Lett.
, vol.48
, Issue.12
, pp. 797-799
-
-
Meyerson, B.S.1
-
5
-
-
0028044386
-
Silicon-Germanium heterojunction bipolar technology: The next leap in silicon?
-
J. D. Cressler et al., “Silicon-Germanium heterojunction bipolar technology: The next leap in silicon?.” in Proc. IEEE Intern. Solid-State.
-
(1994)
Proc. IEEE Intern. Solid-State Circuits Conf.
, pp. 24-27
-
-
Cressler, J.D.1
-
6
-
-
0028734104
-
SiGe HBT's reach the microwave and millimeterwave frontier
-
Circuits Conf., 1994, pp. 24–27. [6] C. Kermarrec et al., “SiGe HBT's reach the microwave and millimeterwave frontier,” in 1994 Bipolar/BiCMOS Circuits & Technology Mtg., 1994, pp. 155–162.
-
(1994)
1994 Bipolar/BiCMOS Circuits & Technology Mtg.
, pp. 155-162
-
-
Kermarrec, C.1
-
7
-
-
0028445047
-
Double-diffused graded SiGe-Base bipolar transistors
-
D. Vook et al., “Double-diffused graded SiGe-Base bipolar transistors,” IEEE Trans. Electron Devices, vol. 41, no. 6, pp. 1013–1018, 1994.
-
(1994)
IEEE Trans. Electron Devices
, vol.41
, Issue.6
, pp. 1013-1018
-
-
Vook, D.1
-
8
-
-
84937078450
-
The Effects of ionizing radiation on SiGe HBT's operated at 77 K
-
J. A. Babcock, J. D. Cressler, S. D. Clark, L. S. Bhamidipati, and D. L. Harame “The Effects of ionizing radiation on SiGe HBT's operated at 77 K,” in Extended Abstracts of the 187th Electrochemical Society Mtg., May 1995.
-
(1995)
Extended Abstracts of the 187th Electrochemical Society Mtg.
-
-
Babcock, J.A.1
Cressler, J.D.2
Clark, S.D.3
Bhamidipati, L.S.4
Harame, D.L.5
-
9
-
-
0028714167
-
Germanium content dependence of radiation damage in strained Si1-x, Gex epitaxial devices
-
H. Ohyama et al., “Germanium content dependence of radiation damage in strained Si l-x, Ge 2 epitaxial devices,” IEEE Trans. Nucl. Sci., vol. 41, no. 6, pp. 2437–2442, 1994.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, Issue.6
, pp. 2437-2442
-
-
Ohyama, H.1
-
10
-
-
0027877999
-
Optimization of SiGe HBT technology for high speed analog and mixed-signal applications
-
D. L. Harame et al., “Optimization of SiGe HBT technology for high speed analog and mixed-signal applications,” in The Tech. Dig. of the IEEE Intern. Electron Device Mtg., pp. 71–74, 1993.
-
(1993)
The Tech. Dig. of the IEEE Intern. Electron Device Mtg.
, pp. 71-74
-
-
Harame, D.L.1
-
11
-
-
0029276715
-
Si/SiGe epitaxial-base transistors-Part I: Materials, physics, and circuits
-
D. L. Harame et al., “Si/SiGe epitaxial-base transistors-Part I : Materials, physics, and circuits,” IEEE Trans. Electron Dev., vol. 42, no. 3, pp. 455–468, 1995.
-
(1995)
IEEE Trans. Electron Dev.
, vol.42
, Issue.3
, pp. 455-468
-
-
Harame, D.L.1
-
12
-
-
0029274349
-
Si/SiGe Epitaxial-base transistors-Part II: Process integration andapplications analog
-
D. L. Harame, “Si/SiGe Epitaxial-base transistors-Part II: Process integration and analog applications,” IEEE Trans. Electron Devices, vol. 42, no. 3, pp. 469–482, 1995.
-
(1995)
IEEE Trans. Devices Electron
, vol.42
, Issue.3
, pp. 469-482
-
-
Harame, D.L.1
-
13
-
-
0028714344
-
Physical mechanisms contributing to enhanced bipolar gain degradation at low dose rates
-
D. M. Fleetwood et al. “Physical mechanisms contributing to enhanced bipolar gain degradation at low dose rates,” IEEE Trans. Nucl. Sci., vol. 41, no 6, pp. 1871–1883, 1994.
-
(1994)
IEEE Trans. Nucl. Sci.
, vol.41
, Issue.6
, pp. 1871-1883
-
-
Fleetwood, D.M.1
-
14
-
-
84937077928
-
Low-frequency noise in UHV/CVD Si- and SiGe-base bipolar transistors, ” to be presented at the 1995 BCTM
-
L. S. Vempati, J. D. Cressler, R. C. Jaeger, and D. L. Harame, “Low-frequency noise in UHV/CVD Si- and SiGe-base bipolar transistors,” to be presented at the 1995 BCTM.
-
-
-
Vempati, L.S.1
Cressler, J.D.2
Jaeger, R.C.3
Harame, D.L.4
-
15
-
-
0024686339
-
Deep-level impurity analysis for p-n junctions of a bipolar transistor from low-frequency g-r noise measurements
-
Y. Dai, “Deep-level impurity analysis for p-n junctions of a bipolar transistor from low-frequency g-r noise measurements,” Solid-State Electronics, vol. 32, no. 6, pp. 439–443, 1989.
-
(1989)
Solid-State Electronics
, vol.32
, Issue.6
, pp. 439-443
-
-
Dai, Y.1
-
16
-
-
0029533502
-
Radiation tolerance of high-performance SiGe HBT's grown by UHV/CVD,” to appear
-
J. A. Babcock et al., “Radiation tolerance of high-performance SiGe HBT's grown by UHV/CVD,” to appear in IEEE Trans. Nucl. Sci., vol. 42, no. 6, Dec. 1995.
-
(1995)
IEEE Trans. Nucl. Sci.
, vol.42
, Issue.6
-
-
Babcock, J.A.1
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