Activation energy for Pt2Si and PtSi formation measured over a wide range of ramp rates

Journal of Materials Research

Volumn 10, Issue 8, 1995, Pages 1953-1957

  Colgan, E G ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRIC RESISTANCE MEASUREMENT; EVAPORATION; FURNACES; HEATING; PHASE TRANSITIONS; PLATINUM COMPOUNDS; POLYCRYSTALLINE MATERIALS; SAPPHIRE; SEMICONDUCTING SILICON; SINGLE CRYSTALS;

KISSINGER PLOT; PLATINUM FILMS; PLATINUM SILICIDE; POLYCRYSTALLINE SILICON; RAMP RATES; RAPID THERMAL ANNEALING;

SEMICONDUCTING FILMS;

EID: 0029358227     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1995.1953     Document Type: Article

References (18)

1. K. Maex Mater. Sci. Eng. R11 (3-4), 53 (1993).
2. C. Canali C. Catallani M. Prudenziati W. H. Wadlin and C. A. Evans Jr., Appl. Phys. Lett. 31 (1), 43 (1977).
3. C.A. Crider, J.M. Poate, J.E. Rowe, and T. T. Sheng J. Appl. Phys. 52 (4), 2860 (1981).
4. M. Wittmer J. Appl. Phys. 54 (9), 5061 (1983).
5. H. Takai P. A. Psaras and K. N. Tu J. Appl. Phys. 58 (11), 4165 (1985).
6. A. A. Naem J. Appl. Phys. 64 (8), 4161 (1988).
7. P.I. Gaiduk and A. Nylandsted Larsen, Appl. Phys. A53, 168 (1991).
8. A. K. Pant S. P. Murarka C. Shepard and W. Lanford J. Appl. Phys. 72 (5), 1833 (1992).
9. F. Nava S. Valeri G. Majni and A. Cembali J. Appl. Phys. 52 (11), 6641 (1981).
10. J.M. Poate and T.C. Tisone, Appl. Phys. Lett. 24 (8), 391 (1974).
11. J.T. Pan and I. A. Blech Thin Solid Films 113, 129 (1984).
12. C.-D. Lien, M-A. Nicolet, and S.S. Lau, Thin Solid Films 143, 63 (1986).
13. M-A. Nicolet and S.S. Lau, in VLSI Electronics: Microstructure Science, edited by N. G. Einspruch and G.B. Larrabee (Academic Press, New York, 1983), Vol. 6, Chap. 6.
14. E.J. Mittemaijer A. Van Gent, and P.J. Van Der Schaaf, Metall. Trans. A 17A, 1441 (1986).
15. E.J. Mittemeijer L. Cheng P.J. Van Der Schaaf, C. M. Brakman and B. M. Korevaar Metall. Trans. A 19A, 925 (1988).
16. E.G. Colgan, L. A. Clevenger and C. Cabral Jr., Appl. Phys. Lett. 65 (16), 2009 (1994).
17. E.G. Colgan, C. Cabral Jr., and D.E. Kotecki, J. Appl. Phys. 77 (2), 614 (1995).
18. Y. Kawazu H. Kudo S. Onari and T. Arai Jpn. J. Appl. Phys. 29 (4), 729 (1990).