Plasma Chemical Vapor Deposition of SiO2 on Air-Exposed Surfaces by Cold Plasma Torch

Journal of the Electrochemical Society

Volumn 142, Issue 8, 1995, Pages 2726-2730

  Ha, Hyun Kwon ^a   Inomata, Kiyoto ^a   Koinuma, Hideomi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC REACTORS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; PLASMAS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

COLD PLASMA TORCH; PLASMA CHEMICAL VAPOR DEPOSITION; TETRAETHOXYSILANE; TETRAMETHOXYSILANE;

SILICA;

EID: 0029358148     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2050082     Document Type: Article

References (10)

1. H. Koinuma, K. Fukuda, M. Kogoma, S. Okazaki, T. Hashimoto, M. Kawasaki, and M. Yoshimoto, in Proceedings of International Symposium on Plasma Chemistry, Pugnochiuso, Italy, Vol. 3, 1521 (1989).
2. K. Inomata, K. Chaudhary, H. Ha, N. Aoki, T. Shiraishi, and H. Koinima, Abstract 1367, p. 1950, The Electrochemical Society Extended Abstracts, Vol. 93–1, Honolulu, HI, May 16–21, 1993.
3. H. Koinuma, H. Ohkubo, T. Hashimoto, K. Inomata, T. Shiraishi, A. Miyanaga, and S. Hayashi, Appl. Phys. Lett., 60, 816 (1992).
4. K. Chaudhary, S. Yamada, K. Inomata, A. Takano, M. Yoshimoto, and H. Koinuma, Report of Research Laboratory of Engineering Materials, Tokyo Institute of Technology, 17, 163 (1992).
5. T. Niki, Boundary, 9, 10 (1993) in Japanese.
6. K. Inomata, H. Ha, K. Chaudhary, and H. Koinuma, Appl. Phys. Lett., 64, 46 (1994).
7. H. Yasuda and T. Hsu, Surf. Sci., 76, 232 (1978).
8. W. A. Pliskin, J. Vac. Technol., 14, 1064 (1977).
9. W. A. Pliskin and H. S. Lehman, Journal of the Electrochemical Society, 112, 1013 (1965).
10. T. Sorita, S. Shiga, K. Ikuta, Y. Egashira, and J. Komiyama, Journal of the Electrochemical Society, 140, 2952 (1993).