An empirical model for planarization with polymer solutions

Japanese Journal of Applied Physics

Volumn 34, Issue 8 R, 1995, Pages 4185-4194

  Schiltz, André ^a  

^a ORANGE LABS   (France)

Author keywords

Lithography; Modeling; Photoresist; Planarization; Polymer; Spin coating

Indexed keywords

COATING TECHNIQUES; COMPUTATIONAL METHODS; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PHOTORESISTS; SOLUTIONS;

PLANARIZATION; POLYMER SOLUTIONS; SPIN COATING;

POLYMERS;

EID: 0029354835     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.34.4185     Document Type: Article

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