SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics

Volumn 34, Issue 8 R, 1995, Pages 4104-4107

Ruo2 bottom electrodes for ferroelectric (Pb, la)(zr, ti)o3 thin films by metalorganic chemical vapor deposition

(4) Takagi, Takeshi a Oizuki, Isamu a Kobayashi, Ichizo a,b Okada, Masaru a

a Department of Industrial Chemistry ^* (Japan)

b TAIYO NIPPON SANSO CORPORATION (Japan)

Author keywords

Bottom electrode; Conductive oxide; Diffusion barrier; Ferroelectric PLZT film; MOCVD; RuO2 thin film

Indexed keywords

ADHESION; ANNEALING; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODES; FILM GROWTH; INTERDIFFUSION (SOLIDS); LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RUTHENIUM COMPOUNDS; THERMAL EFFECTS; THIN FILMS; TITANIUM OXIDES;

DIFFUSION BARRIER; LANTHANUM MODIFIED LEAD ZIRCONATE TITANATE THIN FILMS; RUTHENIUM DIOXIDE BOTTOM ELECTRODES;

FERROELECTRIC MATERIALS;

EID: 0029354515 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.34.4104 Document Type: Article

Times cited : (25)

References (13)

1
- 0022162031
- M. L. Green, M. E. Gross, L. E Papa, K. J. Schnoes and D. Brasen: J. Electrochem. Soc. 132 (1985) 2677.
- (1985) J. Electrochem. Soc , vol.132 , pp. 2677
- Green, M.L.¹ Gross, M.E.² Papa, L.E.³ Schnoes, K.J.⁴ Brasen, D.⁵

2
- 21544479801
- E. Kolawa, F. C. T. So, E. T.-S. Pan and M.-A. Nicolet: Appl. Phys. Lett. 50 (1987) 854.
- (1987) Appl. Phys. Lett , vol.50 , pp. 854
- Kolawa, E.¹ So, F.C.T.² Pan, E.T.³ Nicolet, M.-A.⁴

3
- 0141444497
- L. Krusin-Elbaum, M. Wittmer and D. S. Yee: Appl. Phys Lett. 50 (1987) 1879.
- (1987) Appl. Phys Lett , vol.50 , pp. 1879
- Krusin-Elbaum, L.¹ Wittmer, M.² Yee, D.S.³

4
- 0026763716
- A. Belkind, Z. Orban, J. L. Vossen and J. A. Woollam: Thin Solid Films 207 (1992) 242.
- (1992) Thin Solid Films , vol.207 , pp. 242
- Belkind, A.¹ Orban, Z.² Vossen, J.L.³ Woollam, J.A.⁴

5
- 0024089464
- J. Evans and R. Womack: IEEE. Trans. Solid State Circuits 23 (1988) 1171.
- (1988) IEEE. Trans. Solid State Circuits , vol.23 , pp. 1171
- Evans, J.¹ Womack, R.²

6
- 0027667757
- D. P. Vijay and S. B. Desu: J. Electrochem. Soc. 140 (1993) 2640.
- (1993) J. Electrochem. Soc , vol.140 , pp. 2640
- Vijay, D.P.¹ Desu, S.B.²

7
- 0028508274
- H. Maiwa, N. Ichinose and K. Okazaki: Jpn. J. Appl. Phys. 33 (1994) 5223.
- (1994) Jpn. J. Appl. Phys , vol.33 , pp. 5223
- Maiwa, H.¹ Ichinose, N.² Okazaki, K.³

8
- 0026867932
- K. Tominaga, I. Kobayashi and M. Okada: Jpn. J. Appl. Phys. 31 (1992) L585.
- (1992) Jpn. J. Appl. Phys , vol.31 , pp. 585
- Tominaga, K.¹ Kobayashi, I.² Okada, M.³

9
- 0000860532
- M. Okada and K. Tominaga: J. Appl. Phys. 71 (1992) 1955.
- (1992) J. Appl. Phys , vol.71 , pp. 1955
- Okada, M.¹ Tominaga, K.²

10
- 0027660509
- K. Tominaga, A. Shirayanagi, T. Takagi and M. Okada: Jpn. J. Appl. Phys. 32 (1993) 4082.
- (1993) Jpn. J. Appl. Phys , vol.32 , pp. 4082
- Tominaga, K.¹ Shirayanagi, A.² Takagi, T.³ Okada, M.⁴

11
- 1642603760
- W. D. Reyden, W. A. Reed and E. S. Greiner: Phys. Rev. B 6 (1972) 2089.
- (1972) Phys. Rev. B , vol.6 , pp. 2089
- Reyden, W.D.¹ Reed, W.A.² Greiner, E.S.³

12
- 84956229017
- W. E. Bell and M. Tagami: J. Phys. Chem. 67 (1963).
- (1963) J. Phys. Chem , pp. 67
- Bell, W.E.¹ Tagami, M.²

13
- 0000710324
- Y. Sakashita, H. Segawa, K. Tominaga and M. Okada: J. Appl. Phys. 73 (1993) 7857.
- (1993) J. Appl. Phys , vol.73 , pp. 7857
- Sakashita, Y.¹ Segawa, H.² Tominaga, K.³ Okada, M.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.