High temperature X-ray diffraction study of melt structure of silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers

Volumn 34, Issue 8 A, 1995, Pages 4124-4128

  Waseda, Yoshio ^a   Shinoda, Kozo ^a   Sugiyama, Kazumasa ^a   Takeda, Susumu ^a   Terashima, Kazutaka ^a   Toguri, James Makoto ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH FROM MELT; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY OF LIQUIDS; LIQUID METALS; SINGLE CRYSTALS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

COORDINATION NUMBERS; INTERFERENCE FUNCTION REFINING TECHNIQUE; MOLTEN SILICON; PAIR DISTRIBUTION FUNCTIONS;

SEMICONDUCTING SILICON;

EID: 0029354420     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (21)