Two-Dimensional Simulation of Polysilicon Etching with Chlorine in a High Density Plasma Reactor

IEEE Transactions on Plasma Science

Volumn 23, Issue 4, 1995, Pages 573-580

  Lymberopoulos, Dimitris P ^a   Economou, Demetre J ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHLORINE; DISSOCIATION; ELECTRIC REACTORS; ELECTRODES; ELECTROMAGNETIC FIELD THEORY; ETCHING; MAXWELL EQUATIONS; PLASMA DENSITY; PLASMA SIMULATION; SILICON;

ELECTROMAGNETICS MODULE; ELECTRON IMPACT REACTIONS; HIGH DENSITY PLASMA REACTOR; POLYSILICON ETCHING; TWO DIMENSIONAL FLUID SIMULATION;

PLASMA SOURCES;

EID: 0029352780     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.467977     Document Type: Article

References (14)

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