Modeling of Plasma-Etch Processes Using Well Stirred Reactor Approximations and Including Complex Gas-Phase and Surface Reactions

IEEE Transactions on Plasma Science

Volumn 23, Issue 4, 1995, Pages 539-549

  Meeks, Ellen ^a   Shon, Jong Won ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CHEMISTRY; CHLORINE; COMPUTATIONAL METHODS; ELECTRIC REACTORS; ELECTRONS; IONIZATION; IONS; KINETIC THEORY; MATHEMATICAL MODELS; MAXWELL EQUATIONS; PROBABILITY;

BOLTZMANN EQUATION; ELECTRON ENERGY BALANCE EQUATION; ELECTRON ENERGY DISTRIBUTION FRACTION; ELECTRONEGATIVITY; PLASMA CHEMISTRY; PLASMA ETCH REACTOR; REACTION RATE COEFFICIENTS; WELL STIRRED REACTOR;

PLASMA ETCHING;

EID: 0029352554     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.467973     Document Type: Article

References (44)

1. J. M. Smith, Chemical Engineering Kinetics. New York: McGraw-Hill, 1981.
2. J. P. Longwell and M. A. Weiss, Indus. Eng. Chem., vol. 47, p. 1634, 1955.
3. B. R. Bowman, D. T. Pratt, and C. T. Crowe, “Effect of turbulent mixing and chemical kinetics on nitrogen oxide production in jet stirred reactors,” in Proc. 14th Int. Symp. Combustion, Pittsburgh, PA, 1973, p. 819.
4. D. T. Pratt and J. J. Wormeck, “CREK, a computer program for calculation of combustion reaction equilibrium and kinetics in laminar and turbulent flow,” Washington State Univ. Rep. WSU-ME-TEL-76-1, 1976.
5. J. E. Nenniger, A. Kridiotis, J. Chomiak, J. P. Longwell, and A. F. Sarofim, in Proc. 20th Int. Symp. Combustion, Pittsburgh, PA, 1985, p. 473.
6. P. Glarborg, R. J. Kee, and J. A. Miller, “Kinetic modeling and sensitivity analysis on nitrogen oxide formation in well stirred reactors,” Combust. Flame, vol. 65, pp. 177–202, 1986.
7. A. T. Chen, P. C. Malte, and M. M. Thornton, “Sulfur-nitrogen interaction in stirred flames,” in Proc. 20th Int. Symp. Combustion, Pittsburgh, PA, 1985, p. 769.
8. P. Glarborg, R. J. Kee, J. Grcar, and J. A. Miller, “PSR: A Fortran program for modeling well-stirred reactors,” Sandia Nat. Lab., Livermore, CA, Rep. SAND86-8209, 1986.
9. H. K. Moffat, P. Glarborg, R. J. Kee, J. F. Grcar, and J. A. Miller, “SURFACE PSR: A Fortran program for modeling well-stirred reactors with gas and surface reactions,” Sandia Nat. Lab., Livermore, CA, Rep. SAND91-8001, 1991.
10. M. E. Coltrin, R. J. Kee and F. M. Rupley, “SURFACE CHEMKTN (Version 4.0): A Fortran package for analyzing heterogeneous chemical kinetics at a solid-surface—Gas-phase interface,” Sandia Nat. Lab., Livermore, CA, Rep. SAND90-8003C, 1991.
11. M. E. Coltrin, R. J. Kee, and F. M. Rupley, “Surface Chemkin: A general formalism and software for analyzing heterogeneous chemical kinetics at a gas-surface interface,” Int. J. Chem. Kinet., vol. 23, pp. 1111–1128, 1991.
12. P. Ho, W. Breiland, M. Coltrin, H. Moffat, and R. Buss, “CVD process chemistry,” Semiconductor Equipment Technology Center (SETEC), Final Rep. vol. II, SETEC92-035, 1992.
13. G. L. Rogoff, J. M. Kramer, and R. B. Piejak, “A model for the bulk plasma in an RF chlorine discharge,” IEEE Trans. Plasma Sci., vol. PS-14, p. 103, 1986.
14. S. C. Deshmukh and D. J. Economou, “Factors affecting the Cl atom density in a chlorine discharge,” J. Appl. Phys., vol. 72, p. 4597, 1992.
15. M. A. Lieberman and R. A. Gottscho, “Design of high density plasma sources for materials processing,” in Physics of Thin Films, M. Francombe and J. Vossen, Eds., New York: Academic, 1993.
16. C. Lee, D. B. Graves, M. A. Lieberman and D. W. Hess, “Global model of plasma chemistry in a high density oxygen discharge,” J. Electrochem. Soc., vol. 141, pp. 1546–1555, 1993.
17. R. A. Brown, L. E. Scriven, and W. J. Silliman, in Nonlinear Problems in Dynamics, P. Holmes, Ed., Philadelphia: SIAM, 1980.
18. H. Saito and L. E. Scriven, “Study of coating flow by the finite element method,” J. Computational Phys., vol. 42, p. 53, 1981.
19. W. E. Stewart and J. P. Srensen, “Sensitivity and regression of multicomponent reactor models,” in Proc. 4th Int. 6th Europ. Symp. Chem. Reactor Eng., Frankfurt, Germany, 1976.
20. C. Lee, personal communication, 1993.
21. E. Meeks and M. A. Cappelli, “Two-temperature fluid model for high-pressure plasmas in contact with cooled electrodes,” J. Appl. Phys., vol. 73, pp. 3172–3182, 1993.
22. J. F. Grcar, “The Twopnt Program for boundary value problems,” Sandia Nat. Lab. Rep. SAND91-8230, 1991.
23. J. F. Grcar, R. J. Kee, M. D. Smooke, and J. A. Miller, “A hybrid Newton/time-integration procedure for the solution of steady, laminar, one-dimensional, premixed flames,” in Proc. 21st Int. Symp. Combustion, Pittsburgh, PA, 1986, pp. 1773–1782.
24. R. J. Kee, F. M. Rupley, and J. A. Miller, “Chemkin-II: A fortran chemical kinetics package for the analysis of gas-phase chemical kinetics,” Sandia Nat. Lab., Livermore, CA, Rep. SAND89-8009, 1990.
25. R. J. Kee, F. M. Rupley, and J. A. Miller, “The Chemkin thermodynamic data base,” Sandia Nat. Lab., Livermore, CA, Rep. SAND87-8215B, 1990.
26. T. R. Hayes, R. C. Wetzel, and R. S. Freund, “Absolute electron-impactionization cross-section measurements of the halogen atoms,” Phys. Rev. A, 35, p. 578, 1987.
27. P. S. Ganas, “Electron impact excitation cross sections for chlorine,” J. Appl. Phys., vol. 63, p. 277, 1988.
28. P. C. Cosby, “Dissociation of chlorine molecules,” Meeting Division Atomic Molecular Opt. Phys. (DAMOP), 1990.
29. W. L. Morgan, “A critical evaluation of low-energy electron impact cross sections for plasma processing modeling. I: Cl2, F2, and HCl,” Plasma Chem. Plasma Processing, vol. 12, p. 449, 1992.
30. T. N. Rescigno, “Low-energy electron collision processes in molecular chlorine,” Phys. Rev. A, vol. 50, pp. 1382–1389, 1994.
31. T. N. Rescigno, personal communication, 1994.
32. L. W. Morgan, “ELENDIF: A time-dependent Boltzmann solver for partially ionized plasmas,” Computer Phys. Commun., vol. 58, pp. 127–152, 1990.
33. E. S. Aydil and D. J. Economou, “Theoretical and experimental investigations of chlorine RF glow discharges, I. Theoretical,” J. Electrochem. Soc., vol. 139, pp. 1396–1406, 1992.
34. C. Lai, R. A. Breun, P. W. Sandstrom, A. E. Wendt, N. Hershkowitz, and R. C. Woods, “Langmuir probe measurements of electron temperature and density scaling in multidipole radio frequency plasmas,” J. Vac. Sci. Tech. A, vol. 11, pp. 1199–1205, 1993.
35. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, “Electron-density and energy distributions in a planar inductively coupled discharge,” J. Appl. Phys., vol. 76, pp. 2041–2047, 1994.
36. N. S. J. Braithwaite and J. E. Allen, “Boundaries and probes in electronegative plasmas,” J. Phys. D, vol. 21, pp. 1733–1737, 1988.
37. L. D. B. Kiss and H. H. Sawin, “Comparison of CF3Cl and C2F6 + Cl2 plasma chemistry by power modulation,” J. Electrochem. Soc., vol. 139, 1414–1420, 1992.
38. C. C. Cheng, K. V. Guinn, V. M. Donnelly, and I. P. Herman, “In-situ pulsed laser-induced thermal desorption studies of the silicon chloride surface layer during silicon etching in high density plasmas of Cl2 and Cl2/O2 mixtures,” J. Vac. Sci. Tech. A, vol. 12, pp. 2630–2640, 1994.
39. E. S. Aydil and D. J. Economou, “Theoretical and experimental investigations of chlorine RF glow discharges, II. Experimental,” J. Electrochem. Soc., vol. 139, pp. 1406–1412, 1992.
40. A. D. Richards and H. H. Sawin, “Atomic chlorine concentration measurements in a plasma etching reactor. II. A simple predictive model,” J. Appl. Phys., vol. 61, pp. 799–807, 1987.
41. P. L. Ventzek, M. Grapperhaus, and M. J. Kushner, “Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using 2-dimensional modeling,” J. Vac. Sci. Tech A, submitted.
42. K. E. Greenberg, personal communication, 1994.
43. P. J. Hargis, K. E. Greenberg, P. A. Miller, J. B. Gerardo, J. R. Torcynski et al., Rev. Scientific Instruments, vol. 65, p. 140, 1994.
44. P. Miller, “Langmuir probe measurements in the GEC RF reference cell,” Internal Rep., Sandia Nat. Lab., Livermore, CA, 1994.