Photodecomposition of poly(methylmethacrylate) thin films by monochromatic soft x-ray radiation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 13, Issue 4, 1995, Pages 1885-1892

  Ueno, Nobuo ^c  

^a NTT CORPORATION   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

^c CHIBA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CARBON DIOXIDE; CROSSLINKING; DECOMPOSITION; DESORPTION; ESTERS; ETCHING; HYDROCARBONS; IRRADIATION; MASS SPECTROMETRY; POLYMETHYL METHACRYLATES; X RAYS;

CHAIN SCISSION; DOSE DEPENDENCE; DOUBLE BONDS; FILM THICKNESS; PHOTOFRAGMENTATION; PHOTON ENERGY; SOFT X RAY RADIATION; TOTAL ELECTRON YIELD;

THIN FILMS;

EID: 0029346826     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579675     Document Type: Article

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