Extending particle characterization limits in wafer processing

MICRO

Volumn 13, Issue 7, 1995, Pages

  Brundle, Dick ^a   Uritsky, Yuri ^a   Pan, J Tony ^a  

^a CR Brundle and Associates

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; CONTAMINATION; INTEGRATED CIRCUIT MANUFACTURE; MORPHOLOGY; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICA; X RAY SPECTROSCOPY;

ENERGY DISPERSIVE X RAY SPECTROSCOPY; GAS DISTRIBUTION PLATE; METAL ETCH; MICROPHOTOLUMINESCENCE; WAFER PROCESSING;

PARTICLE SIZE ANALYSIS;

EID: 0029341984     PISSN: 0738713X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)