Fabrication of metallic microstructures by electroplating using deep-etched silicon molds

Journal of Microelectromechanical Systems

Volumn 4, Issue 2, 1995, Pages 81-86

  Sander, D ^a   Hoffmann, R ^a   Relling, V ^a   Mueller, J ^a  

^a HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTROPLATING; FABRICATION; FLUORINE COMPOUNDS; GASES; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MOLDS; PLASMA ETCHING; POLYMERS; SILICON; THREE DIMENSIONAL;

PHOTORESIST MASKING; SILICON MOLDS; TRENCHES;

METALLOGRAPHIC MICROSTRUCTURE;

EID: 0029325753     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.388116     Document Type: Article

References (18)