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Volumn 5, Issue 2, 1995, Pages 2903-2906

Performance of Josephson Array Systems Related to Fabrication Techniques and Design

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CURRENT DENSITY; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; FABRICATION; LEAKAGE CURRENTS; MICROPROCESSOR CHIPS; MICROWAVE CIRCUITS; PHOTOLITHOGRAPHY; SILICA; SILICON WAFERS; TUNNEL JUNCTIONS;

EID: 0029324734     PISSN: 10518223     EISSN: 15582515     Source Type: Journal    
DOI: 10.1109/77.403199     Document Type: Article
Times cited : (17)

References (12)
  • 4
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    • Development of a high quality Nb/Al-Oxide/Nb Josephson junction array for a voltage standard
    • Se Il Park August
    • Se Il Park, Kyu-Tae Kim, Yong Ho Lee, and Rae Duk Lee, “Development of a high quality Nb/Al-Oxide/Nb Josephson junction array for a voltage standard,” J. Korean Phys. Soc., vol. 26, pp. 369-377, August 1993.
    • (1993) J. Korean Phys. Soc. , vol.26 , pp. 369-377
    • Kim, K.-T.1    Lee, Y.H.2    Lee, R.D.3
  • 5
    • 36749108668 scopus 로고
    • High quality refractory Josephson tunnel junctions utilizing thin A1 layers/
    • M. Gurvitch, M.A. Washington, and H.A. Huggins, “High quality refractory Josephson tunnel junctions utilizing thin A1 layers/” Appl. Phys. Lett, vol.45, p. 472, 1983.
    • (1983) Appl. Phys. Lett , vol.45 , pp. 472
    • Gurvitch, M.1    Washington, M.A.2    Huggins, H.A.3
  • 6
    • 0027560912 scopus 로고
    • Relationship of Nb surface morphology and Al coverage to the intrinsic stress of magnetron-sputtered Nb films
    • K. Tsukada, J. Kawai, G. Uehama, and H. Kado, “Relationship of Nb surface morphology and Al coverage to the intrinsic stress of magnetron-sputtered Nb films,” IEEE Trans. Appl. Superconduc. vol. 3, pp. 2944-2946, 1993.
    • (1993) IEEE Trans. Appl. Superconduc. , vol.3 , pp. 2944-2946
    • Tsukada, K.1    Kawai, J.2    Uehama, G.3    Kado, H.4
  • 7
    • 0027559377 scopus 로고
    • Effects of underlayer roughness on Nb/AlOx/Nb junction characteristic
    • S. Kaminami, H. Yamada, N. Niyamoto, and K. Takagi, „Effects of underlayer roughness on Nb/AlOx/Nb junction characteristic”, IEEE Trans. Appl. Supercond. vol. 3, pp. 2182-2186, 1993
    • (1993) IEEE Trans. Appl. Supercond. , vol.3 , pp. 2182-2186
    • Kaminami, S.1    Yamada, H.2    Niyamoto, N.3    Takagi, K.4
  • 8
    • 0038773672 scopus 로고
    • Experimental study on millimeter wave attenuation in Josephson junction striplines for voltage standards
    • Y. Sakamoto, “Experimental study on millimeter wave attenuation in Josephson junction striplines for voltage standards,” PTB Mitteilungen, vol. 104, pp. 151-157, 1994.
    • (1994) PTB Mitteilungen , vol.104 , pp. 151-157
    • Sakamoto, Y.1
  • 9
    • 36049053427 scopus 로고
    • Tunneling model of the superconducting proximity effect
    • W.L. Mc.Millan, “Tunneling model of the superconducting proximity effect,” Phys. Rev., vol. 175, p.537, 1968.
    • (1968) Phys. Rev. , vol.175
    • Mc.Millan, W.L.1
  • 10
    • 84949622963 scopus 로고
    • Berechnung planarer Mikrowellenschaltungen für Spannungsnormale mit in Reihe geschalteten Josephson Elementen
    • E. Vollmer, “Berechnung planarer Mikrowellenschaltungen für Spannungsnormale mit in Reihe geschalteten Josephson Elementen,” Diploma Work, Technische Universität Braunschweig,” 1984.
    • (1984) Diploma Work
    • Vollmer, E.1
  • 11
    • 0024628366 scopus 로고
    • A new self-aligning process for whole wafer tunnel junction fabrication
    • M.G. Blamire, J.E. Evetts, and P.G. Hasko, “A new self-aligning process for whole wafer tunnel junction fabrication,” IEEE Trans. Magn., vol. 25, pp. 1123-1126, 1989.
    • (1989) IEEE Trans. Magn. , vol.25 , pp. 1123-1126
    • Blamire, M.G.1    Evetts, J.E.2    Hasko, P.G.3
  • 12
    • 84949622964 scopus 로고    scopus 로고
    • Hybrid integration of microwave oscillators with Josephson series arrays for the use as voltage standards
    • F.X. Hebrank, P. Gutmann, F. Müller, E. Vollmer, and J. Niemeyer, “Hybrid integration of microwave oscillators with Josephson series arrays for the use as voltage standards,” unpublished
    • Hebrank, F.X.1    Gutmann, P.2    Müller, F.3    Vollmer, E.4    Niemeyer, J.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.