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Volumn 262, Issue 1-2, 1995, Pages 60-66
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CVD of copper using copper(I) and copper(II) β-diketonates
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Author keywords
Chemical vapour deposition; Copper; Electronic devices; Hydrogen
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Indexed keywords
CHEMICAL REACTORS;
CHEMICAL VAPOR DEPOSITION;
COPPER COMPOUNDS;
HYDROGEN;
REACTION KINETICS;
SEMICONDUCTOR DEVICES;
SPECTROMETRY;
TEMPERATURE;
COPPER FORMATION;
DEPOSITION RATE;
ELECTRONIC DEVICES;
HOT WALL BATCH REACTOR;
MASS SPECTROMETRIC ANALYSIS;
PRECURSOR;
REACTION PRODUCTS;
COPPER;
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EID: 0029323573
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(95)05840-0 Document Type: Article |
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Times cited : (45)
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References (15)
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