|
Volumn 16, Issue 6, 1995, Pages 271-273
|
Ultra Low Noise Characteristics of AIGaAs/InGaAs/GaAs Pseudomorphic HEMT's with Wide Head T-Shaped Gate
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ALUMINUM GALLIUM ARSENIDE;
DOSE SPLIT ELECTRON BEAM LITHOGRAPHY;
GATE FOOTPRINT;
GATE HEAD LENGTH;
INDIUM GALLIUM ARSENIDE;
LOW GATE RESISTANCE;
ELECTRON BEAM LITHOGRAPHY;
FABRICATION;
GATES (TRANSISTOR);
MOLECULAR BEAM EPITAXY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM COMPOUNDS;
SPURIOUS SIGNAL NOISE;
HIGH ELECTRON MOBILITY TRANSISTORS;
|
EID: 0029322367
PISSN: 07413106
EISSN: 15580563
Source Type: Journal
DOI: 10.1109/55.790732 Document Type: Article |
Times cited : (50)
|
References (8)
|