Ion Implantation in High Temperature Superconducting Films

IEEE Transactions on Applied Superconductivity

Volumn 5, Issue 2, 1995, Pages 1181-1184

  Ma, Q Y ^a   Wong, A ^a   Carolan, J F ^a   Hardy, W N ^a   Hui, D ^a   Jaeger, N A F ^a   Kato, H ^a  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH; CRYSTAL STRUCTURE; DIAMAGNETISM; HIGH TEMPERATURE SUPERCONDUCTORS; ION IMPLANTATION; IONS; MAGNETIC PROPERTIES; OXIDE SUPERCONDUCTORS; SECONDARY ION MASS SPECTROMETRY; SILICON; SUPERCONDUCTIVITY; X RAY DIFFRACTION;

AC SUSCEPTIBILITY MEASUREMENT; REACTIVE ION IMPLANTATION;

SUPERCONDUCTING FILMS;

EID: 0029321985     PISSN: 10518223     EISSN: 15582515     Source Type: Journal    
DOI: 10.1109/77.402772     Document Type: Article

References (9)

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