In situ diode laser absorption measurements of plasma species in a gaseous electronics conference reference cell reactor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 3, 1995, Pages 954-961

  Oh, Daniel B ^a   Stanton, Alan C ^a   Anderson, Harold M ^a   Splichal, Michael P ^a  

^a SOUTHWEST SCIENCES INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GASES; OPTICAL SENSORS; PLASMA ETCHING; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS; SILICA; SILICON WAFERS; SUBSTRATES;

CARBONYL FLUORIDE; DIODE LASER ABSORPTION MEASUREMENTS; FLUOROCARBON BASED PLASMAS; GASEOUS ELECTRONICS CONFERENCE; REFERENCE CELL REACTOR;

PLASMAS;

EID: 0029308672     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588212     Document Type: Article

References (40)