Low-damage specimen preparation technique for transmission electron microscopy using iodine gas-assisted focused ion beam milling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 13, Issue 3, 1995, Pages 962-966

  Yamaguchi, Akira ^a   Nishikawa, Takeshi ^a  

^a SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMMINUTION; ETCHING; IODINE; ION BEAMS; ION IMPLANTATION; RADIATION DAMAGE; SEMICONDUCTING INDIUM PHOSPHIDE; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION BEAM MILLING; GAS ASSISTED ETCHING; LIQUID METAL FIELD ION SOURCE;

SPECIMEN PREPARATION;

EID: 0029307286     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588213     Document Type: Article

References (11)