SCOPUS 정보 검색 플랫폼

Electronics and Communications in Japan (Part II: Electronics)

Volumn 78, Issue 5, 1995, Pages 21-30

Measuring system of A, B, and C photoresist parameters

(5) Sekiguchi, Atsushi a Minami, Youichi a Matsuzawa, Toshiharu b Takezawa, Toru c Miyakawa, Hisayuki c

a Lithotech Japan Corporation (Japan)

b Technofront Inc ^* (Japan)

c TOUHOKUNAKATANI Corporation ^* (Japan)

Author keywords

antireflective coating; multiple interference effect; photoresist; Photoresist exposure parameter; profile simulation; quality control; spectrophotometer

Indexed keywords

ANTIREFLECTION COATINGS; CALCULATIONS; COMPUTER SIMULATION; LIGHT INTERFERENCE; LIGHT REFLECTION; MEASUREMENT THEORY; OPACITY; QUALITY CONTROL; QUARTZ; REFRACTIVE INDEX; SPECTROPHOTOMETERS; SUBSTRATES;

MEASURING SYSTEMS; MULTIPLE INTERFERENCE EFFECT; PHOTORESIST PARAMETERS; PROFILE SIMULATION;

PHOTORESISTS;

EID: 0029301914 PISSN: 8756663X EISSN: 15206432 Source Type: Journal
DOI: 10.1002/ecjb.4420780503 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.