Low leakage current BaTiO3 thin film capacitors using a multilayer construction

Thin Solid Films

Volumn 259, Issue 2, 1995, Pages 264-269

  Jia, Q X ^a   Chang, L H ^b   Anderson, W A ^b  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

^b UNIVERSITY AT BUFFALO   (United States)

Author keywords

Capacitors; Dielectric properties; Electrical properties and measurements; Sputtering

Indexed keywords

AMORPHOUS FILMS; BARIUM COMPOUNDS; CAPACITANCE; CAPACITORS; DIELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; HEAT TREATMENT; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SUBSTRATES; THIN FILMS;

METALLIC OXIDES; MICROCRYSTALLIZATION; POLYCRYSTALLINE LAYERS; THIN FILM CAPACITORS;

THIN FILM DEVICES;

EID: 0029288926     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(94)06445-8     Document Type: Article

References (18)

1. Characteristics of RF sputtered barium titanate thin films
2. Mechanism of Fatigue in Ferroelectric Thin Films