Ultraviolet-visible ellipsometry for process control during the etching of submicrometer features

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 12, Issue 3, 1995, Pages 591-599

  Blayo, N ^a   Cirelli, R A ^a   Klemens, F P ^a   Lee, J T C ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; MICROELECTRONIC PROCESSING; PLASMA ETCHING; PROCESS CONTROL;

HIGH ASPECT RATIO; MULTILAYER STACKS; SUBMICROMETER FEATURES; ULTRAVIOLET VISIBLE ELLIPSOMETRY;

ELLIPSOMETRY;

EID: 0029276373     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.12.000591     Document Type: Article

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