Application of ion Mobility Spectrometry to Semiconductor Technology: Outgassings of Advanced Polymers under Thermal Stress

Journal of the Electrochemical Society

Volumn 142, Issue 3, 1995, Pages 888-897

  Budde, K J ^a   Holzapfel, W J ^a   Beyer, M M ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; DEGASSING; EPITAXIAL GROWTH; HEATING; OXIDATION; POLYCARBONATES; POLYPROPYLENES; POLYTETRAFLUOROETHYLENES; REACTION KINETICS; SEMICONDUCTOR MATERIALS; VINYL RESINS; VOLATILE ORGANIC COMPOUNDS;

ADVANCED POLYMERS; CONTINUOUS MONITORING; INTEGRATION SCALES; ION MOBILITY SPECTROMETRY; PERFLUOROALKOXY POLYMER; POLYVINYLIDENE FLUORIDE; SEMICONDUCTOR TECHNOLOGY; SOFTENING TEMPERATURE; TEMPERATURE RANGES; WET CHEMICAL TREATMENTS;

SPECTROMETRY;

EID: 0029276010     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2048553     Document Type: Article

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