The STORM technology CAD system

Microelectronics Journal

Volumn 26, Issue 2-3, 1995, Pages 113-135

  Lorenz, J ^a   Hill, C ^b   Jaouen, H ^c   Lombardi, C ^c   Lyden, C ^d   de Meyer, K ^e   Pelka, J ^f   Poncet, A ^g   Rudan, M ^h   Solmi, S ⁱ  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b GEC Marconi Materials Technology Ltd   (United Kingdom)

^c STMICROELECTRONICS   (Italy)

^d UNIVERSITY COLLEGE CORK   (Ireland)

^e IMEC   (Belgium)

^f FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^g ORANGE LABS   (France)

^h UNIVERSITY OF BOLOGNA   (Italy)

ⁱ CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; COMPUTER SIMULATION LANGUAGES; COMPUTER SOFTWARE; COMPUTER SYSTEMS; ELECTRIC PROPERTIES; MODELS; OPTIMIZATION; TECHNOLOGY;

SOFTWARE PACKAGE STORM; SOFTWARE STRUCTURE; TWO DIMENSIONAL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029275293     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/0026-2692(95)98917-G     Document Type: Article

References (45)

1. A European platform for sub-micron technology simulation and optimization
2. Simulation of doping processes
3. Process design using two-dimensional process and device simulators
4. Data structuring for process and device simulations
5. IDAS: An interactive device analysis environment
6. TITAN 5, a two-dimensional process and device simulator
7. programs for VLSI process simulation
8. HFIELDS: a highly flexible 2-D semiconductor-device analysis program
9. Process technology optimization using an integrated process and device simulation sequencing system
10. Simulation of defects in 3-dimensional resist profiles in optical lithography
11. Simulation of the step coverage for chemical vapour deposited silicon dioxide
12. A 3-dimensional model for low-pressure chemical vapour deposition step coverage in trenches and circular vias
13. A dual sticking coefficient chemical vapour deposition model
14. Transparent phase shifting masks
15. Simulation of lithographic images and resist profiles
16. New resolution enhancing mask for projection lithography based on in-situ off-axis illumination
17. Profile evolution in the multi-level technique
18. Simulation of ion-enhanced dry-etch processes
19. Simulation and modelling of evaporated deposition profiles
20. Improvements in simulation of 2D implantation profiles
21. 2 implants in silicon
22. Models for the implantation into multilayer targets
23. Reflection approach for the analytical description of light ion implanted into bilayer structures
24. Efficient multi-dimensional simulation of ion implantation into multilayer structures
25. Simulation of the lateral spread of implanted ions: Theory
26. Dopant diffusion in silicon: a consistent view involving nonequilibrium defects
27. Modelling of dopant diffusion in silicon: An effective diffusivity approach including point-defect couplings
28. A new model for the diffusion of arsenic in polycrystalline silicon
29. Modelling Diffusion in and From Polysilicon Layers
30. Integration in the 2D multi-layer simulator TITAN of a advanced model for dopant diffusion in polysilicon
31. A process simulation model for multilayer structures involving polycrystalline silicon
32. General relationship for the thermal oxidation of silicon
33. Finite-element simulation of local oxidation of silicon
34. The finite-element method for elliptic problems
35. Modeling of stress effects in silicon oxidation
36. Complete bipolar simulation using STORM
37. Inverse modelling with the PROFILE optimization driver
38. Integrated tools for device optimization
39. The STORM technology CAD system