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Volumn 31, Issue 7, 1995, Pages 560-562

Record low-threshold index-guided InGaAs/GaAlAs vertical-cavity surface-emitting laser with a native oxide confinement structure

Author keywords

Semiconductor lasers; Vertical cavity surface emitting lasers

Indexed keywords

ELECTRIC CURRENTS; FABRICATION; HEAT RESISTANCE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDATION; OXIDES; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS;

EID: 0029273231     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19950391     Document Type: Article
Times cited : (126)

References (9)
  • 1
    • 0010027236 scopus 로고
    • Surface emitting lasers and parallel operating devices - fundamentals and prospects
    • IGA, K.: ‘Surface emitting lasers and parallel operating devices - fundamentals and prospects’, IEICE Trans., 1992, E75-A, pp. 12-19
    • (1992) IEICE Trans. , vol.E75-A , pp. 12-19
    • IGA, K.1
  • 4
    • 0028549879 scopus 로고
    • Low threshold half-wave vertical-cavity lasers
    • HUFFAKER, D.L., SHIN, J.; and DEPPE, D.G.: ‘Low threshold half-wave vertical-cavity lasers’, Electron. Lett., 1994, 30, pp. 1946-1947
    • (1994) Electron. Lett. , vol.30 , pp. 1946-1947
    • HUFFAKER, D.L.1    SHIN, J.2    DEPPE, D.G.3
  • 5
    • 0028550787 scopus 로고
    • Low threshold voltage vertical-cavity lasers fabricated by selective oxidation
    • CHOQUETTE, K.D., SCHNEIDER, R.P., Jr., LEAR, K.L., and GEIB, K.M.: ‘Low threshold voltage vertical-cavity lasers fabricated by selective oxidation’, Electron. Lett., 1994, 30, pp. 2043-2044
    • (1994) Electron. Lett. , vol.30 , pp. 2043-2044
    • CHOQUETTE, K.D.1    SCHNEIDER, R.P.2    LEAR, K.L.3    GEIB, K.M.4
  • 6
    • 85024353516 scopus 로고    scopus 로고
    • 0.33 mA threshold InGaAs/GaAs vertical-cavity surface-emitting lasers grown by MOCVD
    • To be presented in CLEO'95
    • MUKAIHARA, T., HAYASHI, Y., HATORI, N, OHNOKI, N., MATSUTANI, A., KOYAMA, F., and IGA, K.,: ‘0.33 mA threshold InGaAs/GaAs vertical-cavity surface-emitting lasers grown by MOCVD’. To be presented in CLEO'95
    • MUKAIHARA, T.1    HAYASHI, Y.2    HATORI, N.3    OHNOKI, N.4    MATSUTANI, A.5    KOYAMA, F.6    IGA, K.7
  • 8
    • 0026224532 scopus 로고
    • Reactive ion beam etch of GalnAsP/InP multilayer and removal of damaged layer by two- step etch
    • MATSUTANI, A., KOYAMA, F., and IGA, K.: ‘Reactive ion beam etch of GalnAsP/InP multilayer and removal of damaged layer by two- step etch’, Jpn. J. Appl. Phys., 1991, 30, pp. 2123-2126
    • (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 2123-2126
    • MATSUTANI, A.1    KOYAMA, F.2    IGA, K.3
  • 9
    • 0028767530 scopus 로고
    • Wide-bandwidth distributed Bragg reflectors using oxiae/GaAs multilayers
    • MACDOUGAL, M.H., ZHAO, H., DAPKUS, P.D., ZIARI, M., and STEIER, W.H.: ‘Wide-bandwidth distributed Bragg reflectors using oxiae/GaAs multilayers’, Electron. Lett., 1994, 30, pp. 1147-1149
    • (1994) Electron. Lett. , vol.30 , pp. 1147-1149
    • MACDOUGAL, M.H.1    ZHAO, H.2    DAPKUS, P.D.3    ZIARI, M.4    STEIER, W.H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.