Quartz etching for phase shifting masks

Microelectronic Engineering

Volumn 27, Issue 1-4, 1995, Pages 263-266

  Dahm, G ^a   Rangelow, I W ^a   Hudek, P ^b   Koops, H W P ^c  

^a UNIVERSITY OF KASSEL   (Germany)

^b INSTITUTE OF CHEMISTRY   (Slovakia)

^c DEUTSCHE TELEKOM LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MICROELECTRONIC PROCESSING; PHASE SHIFT; QUARTZ APPLICATIONS; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

CHROME QUARTZ BLANKS; EDGE ROUGHNESS; PHASE SHIFT MASKS; QUARTZ ETCHING; QUARTZ STRUCTURE; RESIDUAL RESIST LAYER; WET ETCHING;

DRY ETCHING;

EID: 0029253897     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(94)00103-2     Document Type: Article

References (8)

1. Phase-shifting lithography: Maskmaking and its application