Afm observation of self-assembled monolayer films on gaas (110)

Japanese Journal of Applied Physics

Volumn 34, Issue 2S, 1995, Pages 1381-1386

  Ohno, Hirotaka ^a   Motomatsu, Makoto ^a   Mizutani, Wataru ^b   Tokumoto, Hiroshi ^b  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

Atomic force microscope; Atomic scale organic structure; Depression; GaAs (110) surface; N octadecanethiol (ODT); Oxidation; Self assembled monolayer; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; MOLECULES; MONOLAYERS; OXIDATION; SEMICONDUCTING GALLIUM ARSENIDE; SUBSTRATES; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC SCALE ORGANIC STRUCTURE; CIRCULAR DEPRESSIONS; HIGH RESOLUTION LATERAL FORCE MICROSCOPE; OCTADECANETHIOL MOLECULAR ARRANGEMENT; SELF ASSEMBLED MONOLAYER FILMS;

SEMICONDUCTING FILMS;

EID: 0029252374     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.34.1381     Document Type: Article

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