Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

Microelectronic Engineering

Volumn 27, Issue 1-4, 1995, Pages 43-46

  Lercel, M J ^a   Redinbo, G F ^a   Rooks, M ^a   Tiberio, R C ^a   Craighead, H G ^a   Sheen, C W ^b   Allara, D L ^b  

^a School of Applied and Engineering Physics the National Nanofabrication Facility Cornell University ^*  (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ETCHING; FABRICATION; MICROSCOPES; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SUBSTRATES;

ALKYLSILOXANES; ALKYLTHIOLS; ELECTRON BEAM NANOFABRICATION; RESIST; SCANNING TUNNELING MICROSCOPE; SELF ASSEMBLED MONOLAYERS;

NANOTECHNOLOGY;

EID: 0029252038     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(94)00052-V     Document Type: Article

References (19)

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9. High resolution, low-voltage probes from a field emission source close to the target plane