Micromagnetic characteristics of single layer permalloy films in the nanometre range

Journal of Magnetism and Magnetic Materials

Volumn 140-144, Issue PART 1, 1995, Pages 721-722

  Gillies, M F ^a   Chapman, J N ^a   Kools, J C S ^b  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; MAGNETIC ANISOTROPY; MAGNETIC FIELD EFFECTS; MAGNETIC PROPERTIES; MAGNETIZATION; MAGNETRON SPUTTERING; NICKEL ALLOYS; PRESSURE EFFECTS; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFERENTIAL PHASE CONTRAST MODE; FIELD STRENGTH; GROWTH RATE; LAYER THICKNESS; LORENTZ MICROSCOPY; MAGNETIZATION RIPPLE; MICROMAGNETIC PROPERTIES; NANOMETRE RANGE; SINGLE LAYER PERMALLOY FILMS; ULTRA HIGH VIOLET MAGNETRON SPUTTERING;

MAGNETIC THIN FILMS;

EID: 0029250778     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/0304-8853(94)00820-5     Document Type: Article

References (4)