A TiBN film formed by EB-ion plating and N ion bombardment of a TiB film

Vacuum

Volumn 46, Issue 2, 1995, Pages 181-183

  Yang, QQ ^a   Wen, LS ^b   Chen, XZ ^b   Zheng, YQ ^b   Zhuang, YZ ^b  

^a HUNAN UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; DIFFUSION; ELECTRON DIFFRACTION; FILM GROWTH; ION BOMBARDMENT; METALLOGRAPHIC MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

INTERFACIAL DIFFUSION; TITANIUM BORON NITROGEN FILM;

COMPOSITE MATERIALS;

EID: 0029250199     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207X(94)E0036-X     Document Type: Article

References (6)

1. Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphere