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Volumn 38, Issue 2, 1995, Pages 389-400

Reduction of 1 f noise in polysilicon emitter bipolar transistors

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; FLUORINE; GATES (TRANSISTOR); INTERFACES (MATERIALS); ION IMPLANTATION; MATHEMATICAL MODELS; OXIDES; POLYCRYSTALLINE MATERIALS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SIGNAL TO NOISE RATIO;

EID: 0029244620     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(94)00126-Z     Document Type: Article
Times cited : (32)

References (41)
  • 5
    • 0018783802 scopus 로고
    • Effects of emitter edge dislocations on the low frequency noise of silicon planar n-p-n transistors
    • (1979) Electronics Letters , vol.15 , pp. 240
    • Stojadinovic1
  • 28
    • 84914947150 scopus 로고    scopus 로고
    • N. E. Moiseiwitsch and P. Ashburn, IEEE Trans. Electron Devices. Submitted.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.