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Volumn 38, Issue 2, 1995, Pages 389-400
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Reduction of 1 f noise in polysilicon emitter bipolar transistors
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CURRENTS;
FLUORINE;
GATES (TRANSISTOR);
INTERFACES (MATERIALS);
ION IMPLANTATION;
MATHEMATICAL MODELS;
OXIDES;
POLYCRYSTALLINE MATERIALS;
PROBABILITY DENSITY FUNCTION;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE STRUCTURES;
SIGNAL TO NOISE RATIO;
CURRENT GAIN;
EMITTER BASE JUNCTION;
FLUORINE IMPLANTATION;
INTERFACE ANNEAL;
INTERFACIAL OXIDE LAYER;
PASSIVATING SURFACE STATES;
PERIPHERY TO AREA RATIO;
POLYSILICON EMITTER BIPOLAR TRANSISTORS;
SIGNAL TO NOISE RATIO REDUCTION;
SURFACE RECOMBINATION CURRENTS;
BIPOLAR TRANSISTORS;
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EID: 0029244620
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1101(94)00126-Z Document Type: Article |
Times cited : (32)
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References (41)
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