Effects of substrate treatment in positive chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2438, Issue , 1995, Pages 529-539

  Usujima, Akihiro ^a   Tago, Kazuki ^a   Oikawa, Akira ^a   Nakagawa, Kenji ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; PLASMA APPLICATIONS; PROCESSING; SILICON NITRIDE; SPECTROSCOPIC ANALYSIS; SUBSTRATES; SURFACE TREATMENT;

CHEMICALLY AMPLIFIED RESISTS; FILM THICKNESS; POSITIVE RESISTS; RESIST FOOTING; RESIST PROFILE; SUBSTRATE TREATMENT;

PHOTORESISTS;

EID: 0029223299     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)