X-ray diffraction characterization of defect behavior in nanocrystalline nickel during annealing

Nanostructured Materials

Volumn 6, Issue 5-8, 1995, Pages 543-546

  Eastman, J A ^a   Beno, M A ^a   Knapp, G S ^a   Thompson, L J ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARACTERIZATION; CORRELATION METHODS; CRYSTAL DEFECTS; GRAIN GROWTH; GRAIN SIZE AND SHAPE; NICKEL; STRAIN; X RAY DIFFRACTION;

DEBYE WALLER PARAMETER; DISPLACEMENT FIELD; GRAIN BOUNDARY STRUCTURAL RELAXATION; HIGH ANGLE X RAY DIFFRACTION; MICROSTRAIN BROADENING; NANOCRYSTALLINE NICKEL;

NANOSTRUCTURED MATERIALS;

EID: 0029217954     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/0965-9773(95)00116-6     Document Type: Article

References (11)

1. The thermal properties of nanocrystalline Pd from 16 to 300 K
2. Thermal stability of nanocrystalline nickel electrodeposits: differential scanning calorimetry, transmission electron microscopy and magnetic studies
3. Thermodynamics of nanocrystalline platinum