Model for low-resistivity TiSi2 formation on narrow polysilicon lines

Materials Research Society Symposium - Proceedings

Volumn 355, Issue , 1995, Pages 539-544

  Apte, Pushkar P ^a   Pollack, Gordon ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; MODELS; PHASE TRANSITIONS; SILICON; SPUTTER DEPOSITION; STRAIN; TITANIUM ALLOYS;

LINEWIDTH; NARROW LINE SILICIDE PHENOMENON; POLYSILICON LINES; TITANIUM SILICIDE;

METALLIC FILMS;

EID: 0029212254     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)