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Volumn 173-174, Issue , 1995, Pages 7-16
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Low temperature deposition and crystallization of silicon by means of laser techniques
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
EPITAXIAL GROWTH;
ETCHING;
GRAIN SIZE AND SHAPE;
LASER APPLICATIONS;
LOW TEMPERATURE OPERATIONS;
MONOLAYERS;
PHOTOCHEMICAL REACTIONS;
POLYCRYSTALLINE MATERIALS;
POLYSILANES;
RAMAN SCATTERING;
ATOMIC LAYER GROWTH;
LASER CHEMICAL VAPOR DEPOSITION;
LASER FLUENCE;
LASER INDUCED CRYSTALLIZATION;
LASER IRRADIATION;
LAYER BY LAYER GROWTH;
PHOTOCHEMICAL DECOMPOSITION;
SILANE PLASMA;
SEMICONDUCTING SILICON;
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EID: 0029211555
PISSN: 02555476
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
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Times cited : (2)
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References (11)
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