Black silicon method IV: the fabrication of three-dimensional structures in silicon with high aspect ratios for scanning probe microscopy and other applications

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1995, Pages 88-93

  Jansen, Henri ^a   de Boer, Meint ^a   Otter, Bert ^a   Elwenspoek, Miko ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRODES; FILTRATION; INTERFACES (MATERIALS); POLYMERS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SURFACES; TEXTURES; THREE DIMENSIONAL;

BLACK SILICON METHOD; INKJET FILTERS; NEURO ELECTRONIC INTERFACES; SCANNING PROBE MICROSCOPY; THREE DIMENSIONAL STRUCTURES;

DRY ETCHING;

EID: 0029205997     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (28)