Bulk silicon micro electro mechanical devices fabricated from commercial BESOI substrates

Proceedings of the IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1995, Pages 404-407

  Benitez, A ^a   Esteve, J ^a   Bausells, J ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELEROMETERS; CALCULATIONS; CAPACITANCE; CMOS INTEGRATED CIRCUITS; FINITE ELEMENT METHOD; INTEGRATED CIRCUIT MANUFACTURE; METALLOGRAPHIC MICROSTRUCTURE; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES;

BACK ETCHED SILICON INSULATOR SUBSTRATES; FINITE ELEMENT MECHANICAL SIMULATION PROGRAM; SPRING CONSTANT;

MICROELECTROMECHANICAL DEVICES;

EID: 0029205990     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)