Thin epitaxial CeO2 films prepared by aerosol MOCVD

Materials Letters

Volumn 21, Issue 5-6, 1994, Pages 377-380

  Frohlich K ^a   Machajdik, D ^a   Weiss, F ^b   Bochu, B ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM PREPARATION; GONIOMETERS; MAGNESIA; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; SINGLE CRYSTALS; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

IN PLANE MISORIENTED CERIUM OXIDE; THIN EPITAXIAL CERIUM OXIDE FILMS;

CERIUM COMPOUNDS;

EID: 0028753793     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-577X(94)90244-5     Document Type: Article

References (9)