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Applied Optics

Volumn 33, Issue 34, 1994, Pages 7971-7979

Broadband alignment scheme for a stepper system using combinations of diffractive andrefractive lenses

(2) Yoshitake, Yasuhiro a Michael Morris, G b

a Production Engineering Research Laboratory ^* (Japan)

b UNIVERSITY OF ROCHESTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ALIGNMENT; CALCULATIONS; ELECTROPLATING; LENSES; OPTICAL DESIGN; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS; REFRACTIVE INDEX; SILICON;

ACHROMAT LENS; BROADBAND ILLUMINATION; CHROMATIC ABERRATIONS; CHROMATIC CHANGE IN THE PRINCIPAL RAY; MAGNIFICATION; PROJECTION LENS; REFRACTIVE DIFFRACTIVE HYBRID LENS; SCHUPMANN SYSTEM; STEPPER ALIGNMENT SYSTEMS; THIN FILM THEORY;

IMAGING SYSTEMS;

EID: 0028753315 PISSN: 1559128X EISSN: 21553165 Source Type: Journal
DOI: 10.1364/AO.33.007971 Document Type: Article

Times cited : (2)

References (10)

1
- 0026369896
- New alignment sensors for wafer stepper
- Optical/Laser Microlithography IV, V. Pol, ed
- K. Ota, N. Magome and K. Nishi, "New alignment sensors for wafer stepper," in Optical/Laser Microlithography IV, V. Pol, ed., Proc. Soc. Photo-Opt. Instrum. Eng. 1463, 304-314 (1991).
- (1991) Proc. Soc. Photo-Opt. Instrum. Eng , vol.1463 , pp. 304-314
- Ota, K.¹ Magome, N.² Nishi, K.³

2
- 84975603844
- Alignment system for exposure apparatus
- 9 October
- K. Nishi, "Alignment system for exposure apparatus," U.S. patent 4, 962, 318 (9 October 1990).
- (1990) U.S. Patent , vol.4 , Issue.962 , pp. 318
- Nish, K.¹

3
- 84975607019
- Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
- 5, 094, 539, 10 March
- S. Komoriya, T. Kawanabe, S. Nakagawa, T. Oosakaya and N. Iriki, "Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same," U.S. patent 5, 094, 539 (10 March 1992).
- (1992) U.S. Patent
- Komoriya, S.¹ Kawanabe, T.² Nakagawa, S.³ Oosakaya, T.⁴ Iriki, N.⁵

4
- 0001644030
- Hybrid diffractive-refractive lenses and achromats
- T. Sone and N. George, "Hybrid diffractive-refractive lenses and achromats," Appl. Opt. 27, 2960-2971 (1988).
- (1988) Appl. Opt , vol.27 , pp. 2960-3297
- Son, T.¹ Georg, N.²

5
- 84975638735
- Lens usable in the ultraviolet
- 13 September
- D. R. Shafer, "Lens usable in the ultraviolet," U.S. patent 4, 770, 477 (13 September 1988).
- (1988) U.S. Patent , vol.4 , Issue.770 , pp. 477
- Shafe, D.R.¹

6
- 0003972070
- (Pergamon, Bristo
- M. Born and E. Wolf, Principles of Optics (Pergamon, Bristol, 1974), pp. 64-93.
- (1974) Principles of Optic , pp. 64-69
- Bor, M.¹ Wol, E.²

7
- 13444249293
- Field lenses and secondary axial aberration
- A. Offner, "Field lenses and secondary axial aberration," Appl. Opt. 8, 1735-1736 (1969).
- (1969) Appl. Opt , vol.8 , pp. 1735-2173
- Offne, A.¹

8
- 0024681512
- Broadband imaging with holographic lenses
- D. Faklis and G. M. Morris, "Broadband imaging with holographic lenses," Opt. Eng. 28, 592-598 (1989).
- (1989) Opt. Eng , vol.28 , pp. 592-659
- Fakli, D.¹ Morri, G.M.²

9
- 0004055485
- (Hilger, Bristo
- W. T. Welford, Aberrations of Optical Systems (Hilger, Bristol, 1989), p. 207.
- (1989) Aberrations of Optical System , pp. 20
- Welfor, W.T.¹

10
- 0000052040
- Describing holographic optical elements as lenses
- W. C. Sweatt, "Describing holographic optical elements as lenses," J. Opt. Soc. Am. 67, 803-808 (1977).
- (1977) J. Opt. Soc. Am , vol.67 , pp. 803-880
- Sweat, W.C.¹

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