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Volumn 41, Issue 12, 1994, Pages 2413-2416

Investigation of Carrier Generation in Fully Depleted Enhancement and Accumulation Mode SOI MOSFET’s

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; ELECTRIC NETWORK ANALYSIS; ELECTRON TRANSPORT PROPERTIES; LEAKAGE CURRENTS; SEMICONDUCTOR DEVICE MODELS; SILICON ON INSULATOR TECHNOLOGY; TRANSIENTS;

EID: 0028752522     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.337457     Document Type: Article
Times cited : (29)

References (12)
  • 1
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    • (1991) Amsterdam: Kluwer
    • Colinge, J.P.1
  • 3
    • 0019204739 scopus 로고
    • A dual-gate deep depletion technique for generation lifetime measurements
    • Dec.
    • P. W. Barth and J. B. Angell, “A dual-gate deep depletion technique for generation lifetime measurements,” IEEE Trans. Electron Devices, vol. ED-27, pp. 2252–2255, Dec. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 2252-2255
    • Barth, P.W.1    Angell, J.B.2
  • 4
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    • Characterization of carrier generation in enhancement-mode SOI MOSFET’s
    • Sept.
    • D.E. Ioannou, S. Cristoloveanu, M. Mukherjee, and B. Mazhari, “Characterization of carrier generation in enhancement-mode SOI MOSFET’s,” IEEE Electron Device Lett., vol. 11, pp. 409–411, Sept. 1990.
    • (1990) IEEE Electron Device Lett. , vol.11 , pp. 409-411
    • Ioannou, D.E.1    Cristoloveanu, S.2    Mukherjee, M.3    Mazhari, B.4
  • 5
    • 0005592068 scopus 로고
    • Determination of minority carrier generation lifetime in beam-recrystalized silicon-on-insulator structure by using a depletion mode transistor
    • Nov.
    • D. P. Vu and J. C. Pfister, “Determination of minority carrier generation lifetime in beam-recrystalized silicon-on-insulator structure by using a depletion mode transistor,” Appl. Phys. Lett., vol. 47, no. 9, pp. 950–952, Nov. 1985.
    • (1985) Appl. Phys. Lett. , vol.47 , Issue.9 , pp. 950-952
    • Vu, D.P.1    Pfister, J.C.2
  • 6
    • 84856121742 scopus 로고
    • Interface properties and recombination mechanisms in SIMOX structures
    • T. Elewa, H. Haddara, and S. Cristoloveanu, “Interface properties and recombination mechanisms in SIMOX structures,” in The Physics and Technology of Amorphous S, O2, R. A. Devine, Ed. New York: Plenum, 1988, pp. 553–559.
    • (1988) The Physics and Technology of Amorphous S , pp. 553-559
    • Elewa, T.1    Haddara, H.2    Cristoloveanu, S.3
  • 8
    • 0004259460 scopus 로고
    • Advanced semiconductor fundamentals
    • R. F. Pierret, “Advanced semiconductor fundamentals,” vol. VI, in Modular Series on Solid State Devices. Reading, MA: Addison-Wesley, 1987.
    • (1987) , vol.6
    • Pierret, R.F.1
  • 9
    • 0025519501 scopus 로고
    • Analytical models of subthreshold swing and threshold voltage for thin- and ultra-thin-film SOI MOSFET’s
    • Nov.
    • F. Balestra, M. Benachir, J. Brini, and G. Ghibaudo, “Analytical models of subthreshold swing and threshold voltage for thin- and ultra-thin-film SOI MOSFET’s,” IEEE Trans. Electron Devices, vol. 37, pp. 2303–2311, Nov. 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , pp. 2303-2311
    • Balestra, F.1    Benachir, M.2    Brini, J.3    Ghibaudo, G.4
  • 10
    • 0016114553 scopus 로고
    • Field-enhanced carrier generation in MOS capacitors
    • Oct.
    • P. U. Calzolari, S. Graffi, and C. Morandi, “Field-enhanced carrier generation in MOS capacitors,” Solid State Electron., vol. 17, pp. 1001–1011, Oct. 1974.
    • (1974) Solid State Electron. , vol.17 , pp. 1001-1011
    • Calzolari, P.U.1    Graffi, S.2    Morandi, C.3
  • 11
    • 0025483896 scopus 로고
    • An improved model of ' ‘generation width’ for pulsed MOS C-t transient analysis
    • Sept.
    • X. Zhang, “An improved model of ' ‘generation width’ for pulsed MOS C-t transient analysis,” Solid State Electron., vol. 33, pp. 1139–1142, Sept. 1990.
    • (1990) Solid State Electron. , vol.33 , pp. 1139-1142
    • Zhang, X.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.