Novel CoSi2 thin film process with improved thickness scalability and thermal stability

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1994, Pages 691-694

  Chen, Wei Ming ^a   Lin, Jengping ^a   Lee, Jack C ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT COMPOUNDS; EPITAXIAL GROWTH; FILM GROWTH; MOSFET DEVICES; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING; SUBSTRATES; THERMODYNAMIC STABILITY;

SILICIDATION; THERMAL SCALABILITY; THICKNESS SCALABILITY;

THIN FILMS;

EID: 0028752474     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)