CMOS membrane infrared sensors and improved TMAHW etchant

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1994, Pages 531-534

  Lenggenhager, R ^a   Jaeggi, D ^a   Malcovati, P ^a   Duran, H ^a   Baltes, H ^a   Doering, E ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; INFRARED DETECTORS; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; MEMBRANES; OPERATIONAL AMPLIFIERS; SENSORS; SILICON WAFERS; SOLUTIONS; THERMOPILES;

TETRAMETHYL AMMONIUM HYDROXIDE WATER (TMAHW) ETCHING SOLUTION; THERMOELECTRIC INFRARED SENSORS;

CMOS INTEGRATED CIRCUITS;

EID: 0028750686     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)