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Volumn 41, Issue 12, 1994, Pages 2405-2412

A Room Temperature 0.1 µm CMOS on SOI

Author keywords

[No Author keywords available]

Indexed keywords

PRODUCT DESIGN; RANDOM ACCESS STORAGE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING; SILICON ON INSULATOR TECHNOLOGY; TEMPERATURE; THERMAL EFFECTS;

EID: 0028743284     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.337456     Document Type: Article
Times cited : (64)

References (18)
  • 2
    • 0024133319 scopus 로고
    • Single transistor latch in SOI MOSFET’s
    • C. E. Chen et al., “Single transistor latch in SOI MOSFET’s,” IEEE Electron Deveic Lett., p. 636, 1993.
    • (1993) IEEE Electron Deveic Lett. , pp. 636
    • Chen, C.E.1
  • 3
    • 0023961488 scopus 로고
    • Reduction of kink effect in thin-film SOI MOSFET’s
    • J.-P. Colinge, “Reduction of kink effect in thin-film SOI MOSFET’s,” IEEE Electron Device Lett., 97, 1988.
    • (1988) IEEE Electron Device Lett.
    • Colinge, J.-P.1
  • 4
    • 0024937435 scopus 로고
    • Thin-film SOI technology: Solution to many submicron CMOS problems
    • J. P. Colinge, “Thin-film SOI technology: Solution to many submicron CMOS problems,” Tech. Dig. of IEDM, p. 817, 1989.
    • (1989) Tech. Dig. of IEDM , pp. 817
    • Colinge, J.P.1
  • 9
    • 84954088841 scopus 로고
    • Enhanced performance of accumulation mode 0.5 pm CMOS/SOI operated, at 300 K and 85 K
    • L. K. Wong, J. Seliskar, T. Bucelot, A. Edenfeld, and N. Haddad, “Enhanced performance of accumulation mode 0.5 pm CMOS/SOI operated, at 300 K and 85 K,” Tech. Dig. IEDM, p. 769, 1991.
    • (1991) Tech. Dig. IEDM , pp. 769
    • Wong, L.K.1    Seliskar, J.2    Bucelot, T.3    Edenfeld, A.4    Haddad, N.5
  • 11
    • 0027578153 scopus 로고
    • Analagous voltage overshoot during turn-off of thin-film n-channel SOI MOSFET’s
    • E. Dubois, G. G. Shahidi, and M. R. Scheuermann, “Analagous voltage overshoot during turn-off of thin-film n-channel SOI MOSFET’s,” IEEE Electron Device Lett., 164, 1993.
    • (1993) IEEE Electron Device Lett.
    • Dubois, E.1    Shahidi, G.G.2    Scheuermann, M.R.3
  • 12
    • 3643105755 scopus 로고
    • Measurement of SOI MOSFET I-V characteristics without self-healing
    • K. A. Jenkins, J. Y.-C Sun, and J.-L. Pelloie, “Measurement of SOI MOSFET I-V characteristics without self-healing,” in 1994 SOI Conf. Proc., p. 121, 1994.
    • (1994) 1994 SOI Conf. Proc. , pp. 121
    • Jenkins, K.A.1    Sun, J.Y.-C.2    Pelloie, J.-L.3
  • 15
    • 0026986544 scopus 로고
    • SOI: New opportunities for sub-0.25 µ m VLSI
    • G. G. Shahidi, “SOI: New opportunities for sub-0.25 µ m VLSI,” Extend. Abstr., ICSSDM, p. 493, 1992.
    • (1992) Extend. Abstr. , pp. 493
    • Shahidi, G.G.1
  • 16
    • 0026257568 scopus 로고
    • A 2ns Cycle, 3.8 nS Access 512 Kb CMOS ECL with a fully pipelined architecture
    • T. I. Chappell et al., “A 2ns Cycle, 3.8 nS Access 512 Kb CMOS ECL with a fully pipelined architecture,” IEEE J. Solid State Circuits, 1577, 1991.
    • (1991) IEEE J. Solid State Circuits
    • Chappell, T.I.1
  • 18
    • 26544454146 scopus 로고
    • Optimization of two-dimensional collector doping profiles for submicron CiCMOS technologies
    • R. C. Taft, J. D. Hayden, and C. D. Gunderson, “Optimization of two-dimensional collector doping profiles for submicron CiCMOS technologies,” Tech. Dig. of IEDM, p. 869, 1991.
    • (1991) Tech. Dig. of IEDM , pp. 869
    • Taft, R.C.1    Hayden, J.D.2    Gunderson, C.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.