Analysis of Resistance Behavior in Ti-and Ni-Salicided Polysilicon Films

IEEE Transactions on Electron Devices

Volumn 41, Issue 12, 1994, Pages 2305-2317

  Ohguro, Tatsuya ^a   Nakamura, Shin ichi ^a   Koike, Mitsuo ^a   Morimoto, Toyota ^a   Nishiyama, Akira ^a   Ushiku, Yukihiro ^a   Yoshitomi, Takashi ^a   Ono, Mizuki ^a   Saito, Masanobu ^a   Iwai, Hiroshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC NETWORK ANALYSIS; ELECTRIC RESISTANCE; ELECTRIC RESISTANCE MEASUREMENT; GATES (TRANSISTOR); OXIDATION; TITANIUM COMPOUNDS;

NICKEL SALICIDED POLYSILICON FILMS; SELF ALIGNED TITANIUM SILICIDE; TITANIUM SALICIDED POLYSILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0028743070     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.337443     Document Type: Article

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