The deposition of thin films by ion Assisted processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2364, Issue , 1994, Pages 464-469

  Martin, P J ^a   Wang, X ^b   Bendavid, A ^a   Kinder, T J ^a  

^a CSIRO INDUSTRIAL PHYSICS   (Australia)

^b SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON FILMS; CARBON NITRIDE; CATHODES; EVAPORATION; ION BEAM ASSISTED DEPOSITION; ION BOMBARDMENT; METAL IONS; METALS; TITANIUM NITRIDE; DEPOSITION; PHYSICAL PROPERTIES;

ARC DEPOSITION; ARC EVAPORATION; CATH-ODE MATERIALS; GASEOUS IONS; HARD MATERIAL; HIGH QUALITY; IONIZED MATERIALS; MICRO DROPLETS;

THIN FILMS;

CARBON NITRIDE; FILM DEPOSITION; HARD MATERIAL SYNTHESIS; ION BOMBARDMENT;

EID: 0028738275     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.190802     Document Type: Conference Paper

References (10)

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3. F. Fujimoto and K. Ogata, "Formation of carbon nitride films by means of ion assisted dynamic mixing (IVD) method", Jpn. J. Appl. Phys. 32, pp. L420-423, 1993.
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9. A. Bendavid, P. J. Martin, R. P. Netterfield and T. J. Kinder, "The properties of TiN films deposited by filtered arc evaporation'" Surf Coat. Technol. (in press).
10. P. J. Martin, A. Bendavid and T. J. Kinder, "Properties of thin films produced by filtered arc deposition", Proc. 36 Ann. Tech. Conf. Soc. Vacuum. Coat., pp. 375-378, Dallas, April 1993.