Simultaneous control of multiple nonuniformity metrics using site models and monitor wafer control

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop

Volumn , Issue , 1994, Pages 205-210

  Mozumder, P K ^a   Saxena, Sharad ^a   Taylor, Kelly ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL EQUIPMENT; CONTROL SYSTEMS; DEPOSITION; DIELECTRIC MATERIALS; MATHEMATICAL MODELS; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS; SPECIFICATIONS;

APPLIED MATERIALS PRECISION REACTOR; MONITOR WAFER CONTROL; MULTIPLE NONUNIFORMITY METRICS; PLASMA ENHANCED DEPOSITION; SEMICONDUCTOR INDUSTRY; SITE MODELS;

PROCESS CONTROL;

EID: 0028735580     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)