SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 253, Issue 1-2, 1994, Pages 440-444

Comparison of chemical vapor deposition of TiN using tetrakis-diethylamino-titanium and tetrakis-dimethylamino-titanium

(2) Sun, S C a Tsai, M H a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Metallization; Organometallic vapour deposition; Titanium nitride

Indexed keywords

AMMONIA; AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; FILM GROWTH; MORPHOLOGY; PRESSURE EFFECTS; SURFACES; THERMAL EFFECTS; TITANIUM NITRIDE; TUNGSTEN;

GROWTH RATE; STEP COVERAGE; TETRAKIS DIETHYLAMINO TITANIUM; TETRAKIS DIMETHYLAMINO TITANIUM; TITANIUM NITRIDE FILMS;

NITRIDES;

EID: 0028733315 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(94)90363-8 Document Type: Article

Times cited : (56)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.