Effect of vacuum arc deposition parameters on the properties of amorphous carbon thin films

Surface and Coatings Technology

Volumn 68-69, Issue C, 1994, Pages 388-393

  Anders, S ^a   Anders, A ^a   Brown, I G ^a   Wei, B ^a   Komvopoulos, K ^a   Ager III, J W ^a   Yu, K M ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS FILMS; CARBON; DEPOSITION; FRICTION; PLASMAS; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; STRESSES; STRUCTURE (COMPOSITION); VACUUM APPLICATIONS;

FILM QUALITY; NANOINDENTATION; PINON DISK TRIBOTESTING; SURFACE PROFILOMETRY; VACUUM ARC DEPOSITION;

THIN FILMS;

EID: 0028731649     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(94)90191-0     Document Type: Article

References (36)

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