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Volumn 41, Issue 12, 1994, Pages 2318-2325

A Quadruple Well, Quadruple Polysilicon BiCMOS Process for Fast 16 Mb SRAM’s

Author keywords

[No Author keywords available]

Indexed keywords

BIPOLAR INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; MOSFET DEVICES; OPTIMIZATION; PHASE SHIFT; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR STORAGE; THIN FILM DEVICES;

EID: 0028731071     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.337444     Document Type: Article
Times cited : (9)

References (14)
  • 3
    • 0027611070 scopus 로고
    • Integration of a doublepolysilicon emitter-base self-aligned bipolar transistor into a 0.5-μm BiCMOS technology for fast 4-Mb SRAM’s
    • J. D. Hayden, J. D. Burnett, A. H. Perera, T. C. Mele, F. W. Walczyk, V. Kaushik, C. S. Lage, and Y.-C. See, “Integration of a doublepolysilicon emitter-base self-aligned bipolar transistor into a 0.5-μm BiCMOS technology for fast 4-Mb SRAM’s,” IEEE Trans. Electron Devices, vol. 40, p. 1121, 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 1121
    • Hayden, J.D.1    Burnett, J.D.2    Perera, A.H.3    Mele, T.C.4    Walczyk, F.W.5    Kaushik, V.6    Lage, C.S.7    See, Y.-C.8
  • 4
    • 84936897995 scopus 로고
    • A highperformance low-complexity bipolar technology using selective collector compensation
    • R. Taft, J. D. Hayden, D. J. Denning, and H. C. Kirsch, “A highperformance low-complexity bipolar technology using selective collector compensation,” IEDM Tech. Dig., p. 405, 1992.
    • (1992) IEDM Tech. Dig. , pp. 405
    • Taft, R.1    Hayden, J.D.2    Denning, D.J.3    Kirsch, H.C.4
  • 7
    • 0025434979 scopus 로고
    • Field-implant-free isolation by double-well split drive-in
    • C. Zeller, C. Mazure, and M. Kerber, “Field-implant-free isolation by double-well split drive-in,” IEEE Electron Device Lett., vol. 11, p. 215, 1990.
    • (1990) IEEE Electron Device Lett. , vol.11 , pp. 215
    • Zeller, C.1    Mazure, C.2    Kerber, M.3
  • 11
    • 84949624565 scopus 로고
    • Impact of LDD spacer reduction on MOSFET performance for sub-μm gate/space pitches
    • C. Mazure, C. Gunderson, and B. Roman, “Impact of LDD spacer reduction on MOSFET performance for sub-μm gate/space pitches,” IEDM Tech. Dig., p. 893, 1992.
    • (1992) IEDM Tech. Dig. , pp. 893
    • Mazure, C.1    Gunderson, C.2    Roman, B.3
  • 13
  • 14


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.